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THULIR VACUUM TECHNOLOGIES
GST : 33APQPR6798P1ZI

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Substrate Heater

Substrate Heater Specification

Measuring Range
0-1200C

Power Supply
220V AC, 50 Hz

Resolution
0.1C

Temperature
Room temperature to 1200C

Max Height
150 mm

Number of Specimens
1-3

Accuracy
1C

Specimen Size
10 mm to 50 mm

Automation Grade
Semi-automatic

Mounting Type
Table mounted

Gas Pressure
Up to 2 bar

Test Range
Ambient to maximum temperature

Port Size
Standard flange, 1 inch

Hardness
Surface hardness rating 6.5 Mohs

Features
Rapid heating, uniform temperature distribution, corrosion resistant body

Display Type
Digital LED display

Equipment Type
Substrate Heater

Response Time
<5 seconds

Application
Thin film deposition, semiconductor processing

Operating Voltage
220V

Humidity
0-95% RH (non-condensing)

Frequency
50 Hz

Interface Type
RS-485

Usage
Laboratory, research, industrial

Capacity
Max 3 substrates

Machine Weight
5 kg

Test Speed
Up to 100C/min

Test Width
50 mm

Test Stroke
100 mm

Control Mode
Digital PID Controller

Ingress Protection
IP20

Ambient Operating Range
10°C to 35°C

Uniformity
±2°C across substrate

Color
Silver/grey

Weight (without packaging)
4.5 kg

Safety Features
Over-temperature protection, thermal cut-off

External Dimensions
180 mm x 160 mm x 150 mm

Power Consumption
Max 700 W

Insulation
High temperature ceramic fiber

Start-Up Time
<3 minutes

Maintenance
Tool-free access to heating chamber

Surface Material
Stainless steel

Cooling Method
Air-cooled

Thermocouple Type
K-type embedded

Heating Element Type
High purity alumina ceramic

Programmable Profiles
Up to 5 user-defined programs

Substrate Heater Trade Information

Minimum Order Quantity
1 Unit

Supply Ability
1 Unit Per Week

Delivery Time
1 Week

Sample Available
Yes

Sample Policy
Contact us for information regarding our sample policy

Main Domestic Market
South India

About Substrate Heater

The top-notch Substrate Heater is a transcendent solution designed for advanced laboratory and industrial applications, including thin film deposition and semiconductor processing. Featuring a high purity alumina ceramic heating element and K-type embedded thermocouple, it ensures ultra-precise, uniform temperatures (2C). With programmable profiles for up to 5 user-defined settings and digital PID control, users access fully customizable, reliable operation. Safety is paramount with over-temperature protection and thermal cut-off. Rapid start-up (<3 min), air-cooling, and tool-free maintenance make this top-drawer device ideal for professionals demanding accuracy, resilience, and efficiency.

Key Features and Competitive Edge

Widely used by researchers, manufacturers, and semiconductor laboratories, the Substrate Heater stands out with customizable profiles, digital PID control, and rapid uniform heating. Its corrosion-resistant stainless steel surface and high temperature ceramic fiber insulation provide unrivaled durability. Maintenance is simple thanks to tool-free chamber access. Its competitive edge lies in high temperature precision, automation grade, and robust build making it a top-tier choice for cutting-edge scientific and industrial challenges.

Substrate Heater | Payment, Valuation & Supply

Our Substrate Heaters are offered at a competitive sale price, with stock ready for immediate dispatch. With a strong supply ability, we seamlessly meet bulk and urgent requirements across India. Payment terms are flexible, enhancing convenience for valued clients. For valuation, inquiries or custom quote requests are welcomed. Sample policy ensures assurance before bulk orders: sample units are available upon request, subject to terms and availability. Contact us for a tailored pricing and procurement experience.

FAQs of Substrate Heater:

Q: How does the Substrate Heater maintain precise temperature uniformity across the substrate?

A: The Substrate Heater utilizes a high purity alumina ceramic element paired with a digital PID controller, ensuring temperature uniformity within 2C across the entire substrate, perfect for sensitive laboratory and industrial applications.

Q: What safety features are incorporated into the Substrate Heater for operational security?

A: This model includes over-temperature protection and a thermal cut-off feature, which automatically deactivate the unit in unsafe conditions, safeguarding both the substrate and the user.

Q: How can users customize and control the heating process?

A: Up to 5 user-defined programmable profiles can be set through the digital PID controller, enabling precise control and repeatability for diverse experimental or production needs.

Q: Where can this Substrate Heater be utilized?

A: The heater is ideal for laboratories and industries involved in thin film deposition, semiconductor processing, and research, offering a reliable heating solution for a variety of substrate sizes and compositions.

Q: What are the benefits of its maintenance design and cooling method?

A: Tool-free access to the heating chamber streamlines maintenance, while efficient air-cooling supports continuous operation and extends equipment life.

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