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Sputtering Turbo and Diffusion Coating Unit

Sputtering Turbo and Diffusion Coating Unit
Sputtering Turbo and Diffusion Coating Unit

Sputtering Turbo and Diffusion Coating Unit Specification

  • Equipment Type
  • Sputtering Turbo & Diffusion Coating Unit
  • Material
  • Stainless Steel, High-Purity Ceramic, Quartz Glass
  • Processing Type
  • Physical Vapor Deposition (PVD)
  • Condition
  • New
  • Technology
  • Sputtering (Turbo), Diffusion Coating
  • Dimension (L*W*H)
  • 1700 x 900 x 1800 mm
  • Power Mode
  • Electric
  • Voltage
  • 220V/380V, 50/60 Hz
  • Power Consumption
  • 2-5 kW
  • Pressure Output
  • Up to 1 x 10 mbar (Turbo), 1 x 10 mbar (Diffusion)
  • Application
  • Semiconductor, Optoelectronics, Solar Cells, Thin Film Deposition
  • Coating Type
  • Metal, Oxide, Nitride, Custom Thin Films
  • Accessories
  • Target Holders, Substrate Holders, Gas Lines, Turbo Pumps, Diffusion Pumps, Vacuum Gauges
  • Substrate Heating
  • Up to 400C
  • Gas Feed System
  • Mass flow controllers for precise gas mixing
  • Chamber Material
  • High-grade vacuum welded stainless steel
  • Cooling System
  • Water-cooled substrate and targets
  • Pump Down Time
  • Less than 15 minutes to base pressure
  • Target Change Mechanism
  • Quick access, manual/auto option
  • Safety Interlocks
  • Over-pressure, temperature, and water flow protections
  • Deposition Uniformity
  • 5% across 150 mm substrate
  • Noise Level
  • < 60 dB during operation
  • Control Interface
  • Digital touch panel display
  • Vacuum Level
  • Up to 1 x 10 mbar attainable
  • Max Substrate Size
  • 200 mm diameter
  • Film Thickness Monitor
  • Quartz crystal microbalance
  • Process Recipes Storage
  • Up to 100 programmable recipes
  • Installation Type
  • Floor-standing, ported for exhaust
 

Sputtering Turbo and Diffusion Coating Unit Trade Information

  • Minimum Order Quantity
  • 1 Unit
  • Supply Ability
  • 1 Unit Per Week
  • Delivery Time
  • 1 Week
  • Main Domestic Market
  • Andhra Pradesh, Karnataka, Kerala, Pondicherry, Telangana, South India, Tamil Nadu
 

About Sputtering Turbo and Diffusion Coating Unit



Limited stock available: Secure this must-have Sputtering Turbo and Diffusion Coating Unit, designed for unparalleled performance in thin film deposition. Procure best-in-class technology featuring a high-grade vacuum welded stainless steel chamber and water-cooled substrate/targets, supporting up to 200 mm substrates. Benefit from perfect digital touch panel control, rapid pump down time under 15 minutes, and 5% deposition uniformity. Equipped with mass flow controllers, advanced safety interlocks, and up to 100 programmable recipes, this unit delivers precise and reliable coatings. Floor-standing and ported for exhaust, its ideal for semiconductor and optoelectronics applications.

Special Features and Application Versatility

Experience technology at its finest with water-cooled substrates, rapid pump down, and precise film thickness monitoring via quartz crystal microbalance. The units quick target change mechanism and digital interface support versatile usage in semiconductor manufacturing, solar cell fabrication, and advanced optoelectronics. Suited for research labs and large-scale production, this system delivers consistent, high-quality thin films such as metal, oxide, nitride, and custom materials with exceptional ease.


Certifications, Payment, and Port Details

Our Sputtering Turbo and Diffusion Coating Unit complies with recognized industry certifications, ensuring top-tier reliability and safety. We offer flexible payment terms to help suit your procurement planning. Packing & dispatch are managed meticulously for secure freight handling, with delivery options available FOB from major Indian ports. Each unit is professionally packed and shipped to guarantee pristine condition upon arrival, optimizing investment value and operational readiness.


FAQs of Sputtering Turbo and Diffusion Coating Unit:


Q: How does the cooling system in the Sputtering Turbo and Diffusion Coating Unit operate?

A: The cooling system uses a water-cooled mechanism to maintain optimal temperatures for both substrates and targets throughout the deposition process, ensuring stability and superior thin film quality.

Q: What applications are ideal for this coating unit?

A: This equipment is perfect for semiconductor processes, optoelectronics, solar cell fabrication, and any thin film deposition tasks demanding high uniformity and precision.

Q: Where can the equipment be installed?

A: The unit is designed for floor-standing installation and is ported for exhaust, making it suitable for research laboratories, industrial production lines, and cleanroom environments.

Q: What safety features does the coating unit provide?

A: Safety interlocks guard against over-pressure, excessive temperature, and water flow interruptions, safeguarding both operators and equipment during operation.

Q: How does the quick target change mechanism benefit users?

A: It offers manual or automatic options for fast target replacement, minimizing downtime and enhancing productivity during process changes.

Q: What payment and shipping options are available?

A: We provide flexible payment terms and ensure careful freight packing & dispatch, with shipment available FOB from key Indian ports to facilitate smooth, global delivery.

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