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THULIR VACUUM TECHNOLOGIES
GST : 33APQPR6798P1ZI

Vacuum Measuring Instruments

Vacuum Chamber Accessories

Power Supply Machine

DC Power Supply

Coating Unit Spare Parts

Diffusion Pump

Air Cooled Diffusion Pump

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Vacuum Oven

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Vacuum Incubator

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Cylindrical Vacuum Chamber

Multi Tube Joint Adapter

Multi Tube Joint Adapter

RF Magnetron Sputtering System

RF Magnetron Sputtering System

Dosing Pump Maintenance Service

Dosing Pump Maintenance Service

Vacuum Coating Chamber

Vacuum Coating Chamber

Moisture Trap

DC Sputtering Coating Unit

DC Sputtering Coating Unit Specification

Equipment Type
Sputtering Coating Unit

Material
Stainless Steel, Glass Chamber, Aluminum Components

Processing Type
Physical Vapor Deposition (PVD)

Condition
New

Technology
DC Sputtering

Dimension (L*W*H)
Approx. 450 x 400 x 500 mm

Power Mode
Electric

Voltage
220-240 V AC, 50/60 Hz

Power Consumption
500-750 W

Pressure Output
Base Pressure 5 x 10 mbar

Application
Metal Thin Film Deposition, Semiconductor Research, Laboratory Coating, Optical Industry

Coating Type
Thin Film Metallization

Accessories
Vacuum Pump, Power Supply, Target Material Holders, Gas Flow Controller, Sample Holder

Vacuum Pump Type
Rotary Vane or Diaphragm, optional Turbo-molecular upgrade

Observation Window
Integrated for real-time process monitoring

Weight
Approx. 35-40 kg

Chamber Volume
Approx. 8-12 Liters

Deposition Rate Monitor
Quartz Crystal Microbalance (optional attachment)

Target Size
Up to 2 inches diameter

Substrate Holder Temperature
Ambient to 100°C (optional heating)

Control Panel
Digital with Touch Interface

Safety Features
Chamber Interlock, Overcurrent Protection, Emergency Stop

Gas Inlet
Single/Multi Gas (Argon, Nitrogen)

Working Speed
Variable, Typically 1-10 nm/min (dependent on target material and settings)

DC Sputtering Coating Unit Trade Information

Minimum Order Quantity
1 Unit

Supply Ability
1 Unit Per Week

Delivery Time
1 Week

Sample Available
Yes

Sample Policy
Contact us for information regarding our sample policy

Main Domestic Market
South India

About DC Sputtering Coating Unit

We have gained immense recognition in offering premium quality DC Sputtering Coating Unit. The provided DC Sputtering Coating Unit is demanded among customers for their high quality & performance. These DC Sputtering Coating Units are developed by our professionals using premium quality basic material keeping in mind the set norms. Offered DC Sputtering Coating Units are checked in terms of quality in order to dispatch a flawless range.

Features:

Consistent functioning
Easy to operate
Sturdy design

Advanced Deposition Technology

Utilizing DC sputtering, this unit ensures consistent and high-quality thin metal films. The variable working speed and quartz crystal microbalance (optional) help achieve precise control over film thickness, crucial for semiconductor and optical applications. The chambers durable stainless steel and glass construction combine reliability with optimal performance during deposition.

User-Friendly Digital Interface

A modern digital touch control panel simplifies operation, offering easy adjustments of key parameters such as gas flow, temperature, and deposition speed. The integrated observation window enables real-time monitoring of the coating process, promoting accuracy and swift intervention if required.

Comprehensive Safety and Versatility

Designed with chamber interlocks, overcurrent protection, and emergency stops, the system prioritizes user safety. The flexible substrate holder temperature range, universal gas inlet (single/multi gases), and multiple accessories make it adaptable for varied research and industrial needs.

FAQs of DC Sputtering Coating Unit:

Q: How does the DC sputtering coating process work in this unit?

A: The unit employs DC sputtering, where a target material (up to 2 inches diameter) is bombarded with ions, causing atoms to dislodge and deposit as a thin film onto substrates. The process is conducted in a vacuum chamber using Argon or Nitrogen gas and can be monitored in real-time via the observation window.

Q: What types of materials can be deposited using this sputtering unit?

A: This equipment is primarily designed for metal thin film deposition, making it ideal for use with various metals in semiconductor research, laboratory testing, and optical material coating. Target material holders accommodate up to 2-inch diameter targets.

Q: When is it beneficial to upgrade to a turbo-molecular vacuum pump?

A: Upgrading to a turbo-molecular pump is recommended when ultra-high vacuum levels are required, typically for specialized thin film applications needing lower base pressures than achievable with rotary vane or diaphragm pumps, such as advanced semiconductor research.

Q: Where can this DC sputtering unit be installed and operated?

A: Its compact dimensions (approx. 450 x 400 x 500 mm) and manageable weight (3540 kg) allow installation in standard laboratory environments across research institutions, universities, and industrial facilities in India and beyond.

Q: What safety features are integrated in the system?

A: The unit includes a chamber interlock to prevent accidental opening, overcurrent protection to safeguard electronics, an emergency stop for immediate shutdown, and an observation window for safe monitoringensuring maximum operator safety during use.

Q: How is the substrate heating managed in this unit?

A: The substrate holder is designed for ambient operation by default, but optional heating can raise temperatures up to 100C. This aids in improving film adhesion and uniformity, depending on coating requirements.

Q: What benefits does the digital touch control panel provide?

A: The digital touch interface allows for smooth control of deposition parameters, easy navigation between settings, and clear visibility of system status. It streamlines operation, reduces manual errors, and improves reproducibility for research and industrial applications.

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